PCN39-2022 -4LS wafer sort specification optimization for defect bright pixel in dark long images
Post time:2024-06-05 16:35:52
Poster:Innovo Technology
From:Network
The wafer test program will change for defect pixel detection, having a new threshold for Dark Images at Long Exposure (integration time of 696 μs).The remaining defect pixels tests have the same integration time of 101 μs (Short Exposure).Please note that all these tests are performed with same testing criteria,for a maximum sensor temperature of 85 ºC and ADC gain registers defined with following values: AGL1Reg = 101d and AGL2Reg = 111d.
ams AG | |
508030006 、 507830006 、 508080005 、 508070005 More Part# | |
wafer test program More | |
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PCN/EOL More | |
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Please see the document for details | |
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English Chinese Chinese and English Japanese | |
May 3,2022 | |
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PCN39-2022 -4LS | |
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