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PCN39-2022 -4LS wafer sort specification optimization for defect bright pixel in dark long images

PCN39-2022 -4LS wafer sort specification optimization for defect bright pixel in dark long images

Post time:2024-06-05 16:35:52

Poster:Innovo Technology

From:Network

The wafer test program will change for defect pixel detection, having a new threshold for Dark Images at Long Exposure (integration time of 696 μs).The remaining defect pixels tests have the same integration time of 101 μs (Short Exposure).Please note that all these tests are performed with same testing criteria,for a maximum sensor temperature of 85 ºC and ADC gain registers defined with following values: AGL1Reg = 101d and AGL2Reg = 111d.

ams AG

508030006 、 507830006 、 508080005 、 508070005

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wafer test program

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PCN/EOL

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May 3,2022

PCN39-2022 -4LS

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